IBM, Lam Research Focus High-NA EUV on Sub-1-nm Nodes – EE Times
By Alan Patterson Publication Date: 2026-03-13 22:00:00 //php echo do_shortcode(‘[responsivevoice_button voice=”US English Male” buttontext=”Listen to Post”]’) ?> IBM and Lam…
Tag: HighNA
IBM and Lam’s new partnership paves the way toward sub-1nm logic using High-NA EUV — Albany lab to pioneer dry resist process integration
By @tomshardware Publication Date: 2026-03-12 17:14:00 IBM and Lam Research have announced a five-year research collaboration to develop the materials…
IBM, Lam Research join forces on sub-1nm logic and High-NA EUV development
By Levi Li, DIGITIMES Asia, Taipei Publication Date: 2026-03-12 04:17:00 Mukesh Khare, IBM Semiconductors GM (left), and Vahid Vahedi, Lam…
TSMC weighs ASML’s High-NA machines as Intel plans adoption – Tech in Asia
TSMC weighs ASML’s High-NA machines as Intel plans adoption Tech in Asia Article Source https://www.techinasia.com/news/tsmc-weighs-asmls-highna-machines-intel-plans-adoption
TSMC still evaluating ASML’s ‘High-NA’ as Intel eyes future use
Taiwan Semiconductor Manufacturing Co Ltd is a Taiwan-based company mainly engaged in the provision of integrated circuit manufacturing services. The…
Intel hedges its bet for High-NA EUV with the 14A process node — an alternate Low-NA technique has identical yield and design rules
Intel explained the rationale behind its High-NA EUV strategy at its Intel Foundry Direct 2025 conference this week. Despite persistent…
![[News] TSMC Reported to Skip High-NA EUV for A14, Giving Intel an Advantage | TrendForce News](https://i2.wp.com/img.trendforce.com/blog/wp-content/uploads/2021/07/07100238/EUV-system-in-Final-Assembly_48557-624x416.jpg?ssl=1 "[News] TSMC Reported to Skip High-NA EUV for A14, Giving Intel an Advantage | TrendForce News")
[News] TSMC Reported to Skip High-NA EUV for A14, Giving Intel an Advantage | TrendForce News
According to Wccftech, TSMC might delay its adoption of High-NA EUV, with the company expected to bypass the tool for…
Intel details 14A node: 2nd Gen RibbonFET, 15-20% perf-per-watt increase, uses High-NA EUV – TweakTown
Intel details 14A node: 2nd Gen RibbonFET, 15-20% perf-per-watt increase, uses High-NA EUV TweakTown Article Source https://www.tweaktown.com/news/104895/intel-details-14a-node-2nd-gen-ribbonfet-15-20-perf-per-watt-increase-uses-high-na-euv/index.html
Intel confirms high-NA EUV deployment for 14A node – Bits&Chips
As previously announced, Intel will use high-NA EUV lithography to manufacture 14A chips. However, deploying the second-generation EUV scanners is…
Intel processes 30,000 wafers with new High-NA EUV lithography machines – Notebookcheck.net
Intel processes 30,000 wafers with new High-NA EUV lithography machines Notebookcheck.net Article Source https://www.notebookcheck.net/Intel-processes-30-000-wafers-with-new-High-NA-EUV-lithography-machines.968136.0.html