Intel to Embrace New High-NA EUV Technology, Potential Increase in Costs and Losses Predicted – TrendForce Analysis
Intel’s decision to adopt ASML’s high numerical aperture extreme ultraviolet (High-NA EUV) lithography equipment is seen as a strategic move to regain its technological leadership. However, concerns have been raised about the high cost of this equipment, which could lead to potential losses for Intel. ASML plans to manufacture five EUV High-NA devices this year, … Read more