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IBM chip researcher tapped to lead federal EUV lab in Albany Times Union Article Source https://www.timesunion.com/business/article/ibm-chip-researcher-tapped-lead-federal-euv-lab-20259251.php
Intel processes 30,000 wafers with new High-NA EUV lithography machines Notebookcheck.net Article Source https://www.notebookcheck.net/Intel-processes-30-000-wafers-with-new-High-NA-EUV-lithography-machines.968136.0.html
Jan 26 – Intel (INTC, Financial) announced that its new ASML (ASML, Financial) high NA lithography machines are now fully…
Intel has started using two leading-edge ASML High-NA Twinscan EXE:5000 EUV lithography tools, the company revealed on Monday at an…
Intel has exposed 30,000 wafers on two installed high-NA EUV scanners, senior principal engineer Steve Carson announced at the SPIE…
On Monday, Intel Corp INTC announced that the first two advanced extreme ultraviolet (EUV) lithography machines from ASML Holding ASML are…
Shortly after confirming positive progress on its 18A node, with tape-outs set for 1H25, Intel also updated on its adoption…
A rumor has been circulating that the price of ASML’s Hyper-NA EUV technology is set to double, causing major tech…
Intel’s decision to adopt ASML’s high numerical aperture extreme ultraviolet (High-NA EUV) lithography equipment is seen as a strategic move…
![[News] Intel Claims High-NA EUV Machines in Production with Good Results, But 18A Yield Concerns Loom | TrendForce News](https://i1.wp.com/img.trendforce.com/blog/wp-content/uploads/2024/12/27171148/Intel-High-NA-EUV-3-624x416.jpg?resize=624,416&ssl=1 "[News] Intel Claims High-NA EUV Machines in Production with Good Results, But 18A Yield Concerns Loom | TrendForce News")
